•35•DOI:10.19289/j.1004-227x.2023.03.007钒含量对磁控溅射TiAlVN薄膜性能的影响陆昆1,2,*，赵立军21.滁州城市职业学院，安徽滁州2390002.江苏科技大学，江苏镇江210003摘要：采用磁控溅射法在不同V靶功率下制得一系列不同V含量的TiAlVN膜。通过能谱分析、X射线衍射、硬度测量和高温退火研究了V原子分数对TiAlVN膜成分、晶相结构、硬度和抗高温氧化性能的影响。结果表明，不同V含量的TiAlVN膜均为面心立方结构，呈TiN(111)面择优取向。随V原子分数的增大，TiAlVN膜的硬度增大，抗高温氧化性能变差。当V原子分数为16.96%(即磁控溅射的V靶功率为60W)时，TiAlVN膜的硬度最高(为31.67GPa)，抗高温氧化性能较好。关键词：磁控溅射；钛−铝−钒氮化物膜；组织结构；硬度；抗高温氧化性中图分类号：TQ153.1+9文献标志码：A文章编号：1004–227X(2023)03–0035–05Effectofvanadiumcontentonpropertiesofmagnetron-sputteredTiAlVNthinfilmLUKun1,2,*,ZHAOLijun21.ChuzhouCityVocationalCollege,Chuzhou239000,China2.JiangsuUniversityofScienceandTechnology,Zhenjiang212003,ChinaAbstract:AseriesofTiAlVNfilmswithdifferentcontentsofvanadiumwaspreparedbymagnetronsputteringatdifferentpowersofvanadiumtarget.Thecomposition,phasestructure,hardness,andhigh-temperatureoxidationresistanceofTiAlVNfilmwerestudiedbyenergy-dispersivespectroscopy,X-raydiffraction,hardnessmeasurement,andhigh-temperatureannealing,respectively.TheresultsshowedthatallofthesputteredTiAlVNfilmswithdifferentvanadiumcontentshaveaface-centeredcubicstructurewithapreferredorientationofTiN(111)plane.WiththeincreasingofatomfractionofvanadiuminTiAlVNfilm,thehardnessofTiAlVNfilmwasincreased,butitshigh-temperatureoxidationresistancewasdecreased.TheTiAlVNfilmcontaining16.96%(atomfraction)ofvanadium,whichwassputteredatavanadiumtargetpowerof60W,hadthehighesthardness(31.67GPa)andgoodhigh-temperatureoxidationresistance.Keywords:magnetronsputtering;titanium–aluminum–vanadiumnitridefilm;microstructure;hardness,oxidationresistance薄膜技术是改善材料表面性能的重要方法之一[1-2]。TiN薄膜因其硬度低、抗高温氧化性能差等原因，已经不能适应现代高温切削行业的需求。TiAlN薄膜是在TiN薄膜基础上衍生并发展起来的硬质...
