DOI:10.11973/fsyfh-202302005电解锰表面铈/硅烷复合钝化膜的制备及其耐腐蚀性能陈萌萌1,李世佳1,李利军1,2,程昊1(1.广西科技大学生物与化学工程学院广西糖资源绿色加工重点实验室,柳州545006;2.蔗糖产业省部共建协同创新中心,南宁530004)摘要:以硅烷偶联剂KH550和硝酸铈混合溶液为钝化液,通过浸泡法在电解锰表面成功制备了铈/硅烷复合钝化膜,并采用极化曲线、电化学阻抗谱、扫描电子显微图像(SEM)、衰减全反射傅里叶红外光谱(ATR-FTIR)及X射线光电子能谱(XPS)等对铈/硅烷复合钝化膜进行表征和分析。结果表明:电解锰腐蚀电位从钝化前的-1.364V升高到钝化后的-1.225V,腐蚀电流密度从3.58×10-5A/cm2降低到1.91×10-6A/cm2,极化电阻从461.18Ω·cm2升高到4706Ω·cm2,电流阻碍效率达到了94.66%,所制备的钝化膜可显著提高电解锰的耐腐蚀性能。关键词:电解锰;硅烷偶联剂KH550;硝酸铈;钝化膜;耐腐蚀性能中图分类号:TG174.4文献标志码:B文章编号:1005-748X(2023)02-0025-08PreparationandCorrosionResistanceofCeriumandSilaneCompositePassivationFilmonElectrolyticManganeseSurfaceCHENMengmeng1,LIShijia1,LILijun1,2,CHENGHao1(1.GuangxiKeyLaboratoryofGreenProcessingofSugarResources,CollegeofBiologicalandChemicalEngineering,GuangxiUniversityofScienceandTechnology,Liuzhou545006,China;2.ProvinceandMinistryCo-sponsoredCollaborativeInnovationCenterofSugarcaneandSugarIndustry,Nanning530004,China)Abstract:TheceriumandsilanecompositepassivationfilmonthesurfaceofelectrolyticmanganesewassuccessfullyfabricatedbyimmersinginpassivationsolutionwhichwasamixtureofsilanecouplingagentKH550andceriumnitrate.Thecompositepassivationfilmwascharacterizedandanalyzedthroughpolarizationcurve,electrochemicalimpedancespectroscopy(EIS),scanningelectronmicroscopy(SEM),attenuatedtotalreflectionFouriertransforminfraredspectroscopy(ATR-FTIR)andX-rayphotoelectronspectroscopy(XPS).Itwasfoundthatthecorrosionpotentialofelectrolyticmanganeseincreasedfrom-1.364Vbeforepassivationto-1.225Vafterpassivation,thecorrosioncurrentdensitydecreasedfrom3.58×10-5A/cm2to1.91×10-6A/cm2,thepolarizationresistanceincreasedfrom461.18Ω·cm2to4706Ω·cm2,andthecurrentblockingefficiencyreached94.66%.Theprep...
