Designation:F1617–98StandardTestMethodforMeasuringSurfaceSodium,Aluminum,Potassium,andIrononSiliconandEPISubstratesbySecondaryIonMassSpectrometry1ThisstandardisissuedunderthefixeddesignationF1617;thenumberimmediatelyfollowingthedesignationindicatestheyearoforiginaladoptionor,inthecaseofrevision,theyearoflastrevision.Anumberinparenthesesindicatestheyearoflastreapproval.Asuperscriptepsilon(e)indicatesaneditorialchangesincethelastrevisionorreapproval.1.Scope1.1Thistestmethodcoversthedeterminationoftotalsodium,aluminum,potassium,andirononthesurfaceofmirror-polishedsinglecrystalsiliconandsiliconepisubstratesusingsecondaryionmassspectrometry(SIMS).Thistestmethodmeasuresthetotalamountofeachmetal,becausethistestmethodisindependentofthemetal’schemistryorelectri-calactivity.1.2Thistestmethodcanbeusedforsiliconwithalldopantspeciesanddopantconcentrations.1.3Thistestmethodisespeciallydesignedtobeusedforsurfacemetalcontaminationthatislocatedwithinapproxi-mately5nmofthesurfaceofthewafer.1.4Thistestmethodisespeciallyusefulfordeterminingthesurfacemetalarealdensitiesinthenativeoxideorchemicallygrownoxideofpolishedsiliconsubstratesaftercleaning.1.5Thistestmethodisusefulforsodium,aluminum,potassium,andironarealdensitiesbetween109and1014atoms/cm2.ThelimitofdetectionisdeterminedbyeithertheBLANKvalueorbycountratelimitations,andmayvarywithinstrumentation.1.6Thistestmethodiscomplementaryto:1.6.1TotalreflectionX-rayfluorescence(TXRF),thatcandetecthigheratomicnumberZ,surfacemetalssuchasiron,butdoesnothaveuseful(<1011atoms/cm2)detectionlimitsforsodium,potassium,andaluminumonsilicon.1.6.2ElectronspectroscopyforchemicalanalysisandAu-gerelectronspectroscopythatcandetectmetalsurfacearealdensitiesdowntotheorderof1012to1013atoms/cm2.1.6.3Vaporphasedecomposition(VPD)ofsurfacemetalsfollowedbyatomicabsorptionspectroscopy(AAS)orinduc-tivelycoupledplasmamassspectrometry(ICP-MS)oftheVPDresidue,wherethemetaldetectionlimitsare108to1010atoms/cm2.ThereisnospatialinformationavailableandtheVPDpreconcentrat...
