Designation:E1127−08(Reapproved2015)StandardGuideforDepthProfilinginAugerElectronSpectroscopy1ThisstandardisissuedunderthefixeddesignationE1127;thenumberimmediatelyfollowingthedesignationindicatestheyearoforiginaladoptionor,inthecaseofrevision,theyearoflastrevision.Anumberinparenthesesindicatestheyearoflastreapproval.Asuperscriptepsilon(´)indicatesaneditorialchangesincethelastrevisionorreapproval.1.Scope1.1ThisguidecoversproceduresusedfordepthprofilinginAugerelectronspectroscopy.1.2Guidelinesaregivenfordepthprofilingbythefollow-ing:SectionIonSputtering6AngleLappingandCross-Sectioning7MechanicalCratering8MeshReplicaMethod9NondestructiveDepthProfiling101.3ThevaluesstatedinSIunitsaretoberegardedasstandard.Nootherunitsofmeasurementareincludedinthisstandard.1.4Thisstandarddoesnotpurporttoaddressallofthesafetyproblems,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappro-priatesafetyandhealthpracticesanddeterminetheapplica-bilityofregulatorylimitationspriortouse.2.ReferencedDocuments2.1ASTMStandards:2E673TerminologyRelatingtoSurfaceAnalysis(Withdrawn2012)3E684PracticeforApproximateDeterminationofCurrentDensityofLarge-DiameterIonBeamsforSputterDepthProfilingofSolidSurfaces(Withdrawn2012)3E827PracticeforIdentifyingElementsbythePeaksinAugerElectronSpectroscopyE996PracticeforReportingDatainAugerElectronSpec-troscopyandX-rayPhotoelectronSpectroscopyE1078GuideforSpecimenPreparationandMountinginSurfaceAnalysisE1577GuideforReportingofIonBeamParametersUsedinSurfaceAnalysisE1634GuideforPerformingSputterCraterDepthMeasure-mentsE1636PracticeforAnalyticallyDescribingDepth-ProfileandLinescan-ProfileDatabyanExtendedLogisticFunc-tionE1829GuideforHandlingSpecimensPriortoSurfaceAnalysis2.2ISOStandard:4ISO/TR22335:2007SurfaceChemicalAnalysis—DepthProfiling—MeasurementofSputteringRate:Mesh-ReplicaMethodUsingaMechanicalStylusProfilometer3.Terminology3.1Definitions:3.1.1Fordefinitionsoftermsusedinthisguide,refertoTerminologyE673.4.SummaryofGuide4.1Inion...
